• ISSN 0258-2724
  • CN 51-1277/U
  • EI Compendex
  • Scopus 收录
  • 全国中文核心期刊
  • 中国科技论文统计源期刊
  • 中国科学引文数据库来源期刊

物理气相沉积法制备的CrN涂层的摩擦学性能

莫继良 朱旻昊

莫继良, 朱旻昊. 物理气相沉积法制备的CrN涂层的摩擦学性能[J]. 西南交通大学学报, 2008, 21(2): 280-284.
引用本文: 莫继良, 朱旻昊. 物理气相沉积法制备的CrN涂层的摩擦学性能[J]. 西南交通大学学报, 2008, 21(2): 280-284.
MO Jiliang, ZHU Minhao. Tribological Properties of CrN Coatings Prepared by Physical Vapor Deposition[J]. Journal of Southwest Jiaotong University, 2008, 21(2): 280-284.
Citation: MO Jiliang, ZHU Minhao. Tribological Properties of CrN Coatings Prepared by Physical Vapor Deposition[J]. Journal of Southwest Jiaotong University, 2008, 21(2): 280-284.

物理气相沉积法制备的CrN涂层的摩擦学性能

基金项目: 

教育部新世纪优秀人才计划(NCET-04-0885)

四川省科技攻关计划(04CN032-009)

详细信息
    作者简介:

    莫继良(1982- ),男,博士研究生,研究方向为表面工程及摩擦学,E-mail:mojiliang126@126.com

    通讯作者:

    朱旻昊(1968- ),男,教授,博士,博士生导师,研究方向为摩擦学及表面工程,E-mail:zhuminhao@home.swjtu.cn

Tribological Properties of CrN Coatings Prepared by Physical Vapor Deposition

  • 摘要: 用CETR UMT-2摩擦磨损试验机对比磁过滤阴极真空弧源和多弧离子镀方法制备的CrN涂层在往复滑动条件下的摩擦磨损行为.用X射线衍射、显微硬度计、纳米压痕仪表征涂层的基本特性;用台阶仪、扫描电子显微镜和电子能谱对磨痕进行微观分析,探讨不同结构CrN涂层的磨损失效机理.与多弧离子镀技术制备的CrN涂层相比,磁过滤阴极真空弧源技术制备的CrN涂层更光滑、致密和连续,有较高的硬度和较优越的耐磨性能.涂层微结构的差异是造成摩擦磨损性能差异的主要原因.2种CrN涂层的滑动磨损为磨粒磨损和氧化磨损共同作用的结果.

     

  • CUNHA L,ANDRITSCHKY M,PISCHOW K,et al.Microstructure of CrN coatings produced by PVD techniques[J].Thin Solid Films,1999,355-356:465-471.[2] NAVINSEK B,PAN JAN P,CVELBAR A.Characterization of low temperature CrN and TiN (PVD) hard coatings[J].Surface and Coatings Technology,1995,74(1-3,Part 1):155-161.[3] HOY R,SLOOF W G,JANSSEN G C A M.Hard dense CrN.coatings on three-dimensional objects[J].Surface and Coatings Technology,2004,179(2-3):215-222.[4] PIOT O,GAUTIER C,MACHET J.Comparative study of CrN coatings deposited by ion plating and vacuum are evaporation.Influence of the nature and the energy of the hyer-forming speeies on the structural and mochanical properties[J].Surface and Coatings Technology,1997,94-95 (1-3):409-415.[5] GAUTIER C,MOUSSAOUI H,ELSTNER F.Comparative study of mechanical and structural properties of CrN films deposited by d.e.magnetron sputtering and vacuum are evaporation[J].Surface and Coatings Technology,1996,86-87(1-3,Part 1):254-262.[6] NAVINSEK B,PAN JAN P.Oxidation of CrN,hard coatings reactively sputtered at low temperature[J].Thin Solid Films,1993,223(1):4-6.[7] SU Y L,YAO S H,WU C T.Comparisons of eharaeterizatiorm and tribological performance of TiN and CrN deposited by cathodic are plasma deposition process[J].Wear,1996,199(1):132-141.[8] 莫继良,朱曼昊,安剑,等.物理气相沉积CrN涂层的研究进展[J].中国表面工程,2006,19(4-11):71-75.MO Jiliang,ZHU Minhao,AN Jian,et al.Development in PVD CrN Coating[J].China Surf.Eng.,2006,19 (4-11):71-75.[9] KONYASHIN I,FOX-RABINOVICH G,DODONOV A.TiN thin films deposited by filtered are-evaporation:structure,properties and applications[J].J.Materials Science,1997,32(22):6 029-6 038.[10] MARTIN P J,BENDAVID A.Review of the filtered vacuum are process and materials deposition[J].Thin solid films,2001,394(1-2):1-15.[11] HARRIS S G,DOYLE E D,VLASVELD A C,et al.Dry cutting performance of partially filtered are deposited titanium aluminium nitride coatings with various metal nitride base coatings[J].Surface and Coatings Technology,2001,146-147(9-10):305-311.
  • 加载中
计量
  • 文章访问数:  1363
  • HTML全文浏览量:  60
  • PDF下载量:  438
  • 被引次数: 0
出版历程
  • 收稿日期:  2008-02-29
  • 刊出日期:  2008-04-25

目录

    /

    返回文章
    返回