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Al掺杂T-ZnO晶须的光致发光及场发射性能

范希梅 周祚万 李艳霞 张会广

范希梅, 周祚万, 李艳霞, 张会广. Al掺杂T-ZnO晶须的光致发光及场发射性能[J]. 西南交通大学学报, 2008, 21(6): 806-809,815.
引用本文: 范希梅, 周祚万, 李艳霞, 张会广. Al掺杂T-ZnO晶须的光致发光及场发射性能[J]. 西南交通大学学报, 2008, 21(6): 806-809,815.
FAN Ximei, ZHOU Zuowan, LI Yanxia, ZHANG Huiguang. Field Emission and Photoluminescence Properties of Al-Doped T-ZnO Whiskers[J]. Journal of Southwest Jiaotong University, 2008, 21(6): 806-809,815.
Citation: FAN Ximei, ZHOU Zuowan, LI Yanxia, ZHANG Huiguang. Field Emission and Photoluminescence Properties of Al-Doped T-ZnO Whiskers[J]. Journal of Southwest Jiaotong University, 2008, 21(6): 806-809,815.

Al掺杂T-ZnO晶须的光致发光及场发射性能

基金项目: 

四川省重点科技攻关项目(2006z02-06-3)

详细信息
    作者简介:

    范希梅(1970- )女,博士,副教授,研究方向为ZnO薄膜及半导体材料的研究,电话:028-87602714,E-mail:xmfan@swjtu.edu.cn

Field Emission and Photoluminescence Properties of Al-Doped T-ZnO Whiskers

  • 摘要: 用丝网印刷法将Al掺杂的T-ZnO晶须制备成薄膜,以研究其结构形貌、光致发光及场发射性能.所有发光谱均由强的紫外光发射(发光中心集中在373~383 nm)和宽的黄绿光发射(发光中心集中在510~540 nm)组成.ZnO薄膜的内部缺陷浓度决定黄绿光发射的强度.掺杂0.5 mol/L的Al样品的紫外光强度最大,场发射性能最好,其开启电场和阈值电场分别达到0.74 V/μm和2.6 V/μm,场增强因子值为30249.

     

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出版历程
  • 收稿日期:  2007-12-19
  • 刊出日期:  2008-12-25

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