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平面工艺IGBT制作及导通压降的PIN模型计算

袁寿财 刘亚媚

袁寿财, 刘亚媚. 平面工艺IGBT制作及导通压降的PIN模型计算[J]. 西南交通大学学报, 2009, 22(5): 648-653.
引用本文: 袁寿财, 刘亚媚. 平面工艺IGBT制作及导通压降的PIN模型计算[J]. 西南交通大学学报, 2009, 22(5): 648-653.
YUAN Shoucai, LIU Yamei. Planar IGBT Fabrication and Forward Voltage Drop Calculated by PIN Model[J]. Journal of Southwest Jiaotong University, 2009, 22(5): 648-653.
Citation: YUAN Shoucai, LIU Yamei. Planar IGBT Fabrication and Forward Voltage Drop Calculated by PIN Model[J]. Journal of Southwest Jiaotong University, 2009, 22(5): 648-653.

平面工艺IGBT制作及导通压降的PIN模型计算

基金项目: 

江西省教育厅基金资助项目(GJJ08380)

江西省自然科学基金资助项目(资助项目2008GZH0018)

详细信息
    作者简介:

    袁寿财(1963- ),男,博士,教授,研究方向为半导体功率器件、微纳米电子器件与电路,电话:15979809384,E-mail:scyuanyf@263.net

Planar IGBT Fabrication and Forward Voltage Drop Calculated by PIN Model

  • 摘要: 以硅平面工艺生产设备为基础,设计制作了基于外延衬底的IGBT器件,器件的实测输出电流-电压特性良好,阈值电压在3.7~4.8 V之间.将制作IGBT器件的结构和工艺参数代入PIN二极管模型计算其正向导通压降,并将计算结果与器件的实测参数进行了比较.结果表明:小电流区段符合较好;但大电流区段由于模型简化和测试系统寄生串联电阻的影响出现偏差,对于同一导通电流,计算值比实测值约小8%.

     

  • 袁寿财.IGBT场效应半导体功率器件导论[M].北京:科学出版社,2007:171.[2] BALIGA B J.The insulated gate rectifier(IGR):a new power switching device[C] ∥IEDM82.San Francisco:Institute of Electrical Electronics Engineers,1982:264-267.[3] AOKI T,TSUZUKI Y,MIURA S.High performance and reliability trench gate power MOSFET with partially thick gate oxide film structure(PTOx-TMOS)[C] ∥Proc.of the 18th International Symposium on Power Semiconductor Devices ICs.Naples:Japan Science and Technology Agency,2006:1-4.[4] ROIG J,CORTES I,JIMENEZ D.A numerical study of scaling issues for trench power MOSFETs[J].Solid-State Electronics,2005,49:965-975.[5] YAMASHITA J,YOSHIDA C,FUJII C.et al.The 5th generation highly rugged planar IGBT using sub-micron process technology[C] ∥Proceedings of the 13th International Symposium on Volume.Osaka:Power Semiconductor Devices and ICs,2001:421-424.[6] RAHIMO M,KOPTA A,EICHER S.Next generation planar IGBTs with SPT technology[J].Power electronics Europe Magazine,2005,6(9):1-5.[7] MORI M,OYAMA K,ARAI T,et.al.A planar-gate high-conductivity IGBT (HiGT) with hole-barrier layer[J].IEEE transactions on Electron Devices,2007,54(6):1515-1520.[8] YUAN Shoucai,LIU Yamei,Two-mask silicides fully self-aligned for trench gate power IGBTs with superjunction structure[J].IEEE Electron Device Letters,2008,29(8):931-933.[9] 刘恩科,半导体物理学[M].北京:国防工业出版社,1979:147.[10] GHANDHI S K.Semiconductor power devices:physics of operation and fabrication technology[M].New York:John Wiley Sons,1977:97.
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出版历程
  • 收稿日期:  2007-10-29
  • 刊出日期:  2009-11-12

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